ISSN: 0948-1907 - British Library Electronic Legal Deposit Catalogue-Journal Issues and Articles Search Results

ISSN 0948-1907

1. 3D CFD Simulations: Effect of Operation Parameters on the Deposition of Photocatalytic TiO2 Nanoparticles by MOCVD. Issue 4 (7th January 2015)

Authors:: Othman, Siti Hajar; Abdul Rashid, Suraya; Mohd. Ghazi, Tinia Idaty; Abdullah, Norhafizah
Journal:: Chemical vapor deposition
Issue:: Volume 21:Issue 4/6(2015:Jun.)
Page Start:: 99
Record Type:: Journal Article
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2. A Facile Route to Thin Films of Zinc Carbodiimide Using Aerosol‐assisted CVD. Issue 10 (10th November 2015)

Authors:: Kaye, Karl M.; Grantham, William; Hyett, Geoffrey
Journal:: Chemical vapor deposition
Issue:: Volume 21:Issue 10/12(2015:Dec.)
Page Start:: 281
Record Type:: Journal Article
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3. A Hybrid‐Type CVD System for Graphene Growth1. Issue 7 (September 2015)

Authors:: Skoblin, Grigory; Lindvall, Niclas; Sun, Jie; Yurgens, August
Journal:: Chemical vapor deposition
Issue:: Volume 21:Issue 7/9(2015:Sep.)
Page Start:: 176
Record Type:: Journal Article
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4. A Langmuir‐Kinetic Model for CVD Growth from Chemical Precursors1. Issue 7 (7th August 2013)

Authors:: Raj, Rishi; Krumdieck, Susan P.
Journal:: Chemical vapor deposition
Issue:: Volume 19:Issue 7/9(2013:Sep.)
Page Start:: 260
Record Type:: Journal Article
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5. A Micro‐pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti‐Doping. Issue 4 (16th May 2013)

Authors:: Li, Xianglin; Fan, Ng Chin; Fan, Hong Jin; Knez, Mato; Yong, Qin
Journal:: Chemical vapor deposition
Issue:: Volume 19:Issue 4/6(2013:Jun.)
Page Start:: 104
Record Type:: Journal Article
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6. A Novel Manganese(II) MOCVD Precursor: Synthesis, Characterization, and Mass Transport Properties of Mn(hfa)2tmeda1. Issue 1 (18th February 2013)

Authors:: Lipani, Zaira; Catalano, Maria R.; Rossi, Patrizia; Paoli, Paola; Malandrino, Graziella
Journal:: Chemical vapor deposition
Issue:: Volume 19:Issue 1/3(2013:Mar.)
Page Start:: 22
Record Type:: Journal Article
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7. A Process‐Structure Investigation of Aluminum Oxide and Oxycarbide Thin Films prepared by Direct Liquid Injection CVD of Dimethylaluminum Isopropoxide (DMAI)1 . Issue 10 (10th November 2015)

Authors:: Baggetto, Loïc; Charvillat, Cédric; Esvan, Jérôme; Thébault, Yannick; Samélor, Diane; Vergnes, Hugues; Caussat, Brigitte; Gleizes, Alain; Vahlas, Constantin
Journal:: Chemical vapor deposition
Issue:: Volume 21:Issue 10/12(2015:Dec.)
Page Start:: 343
Record Type:: Journal Article
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8. A Quantum Chemical Descriptor for CVD Precursor Design: Predicting Decomposition Rates of TBP and TBAs Isomers and Derivatives1. Issue 7 (September 2015)

Authors:: Stegmüller, Andreas; Tonner, Ralf
Journal:: Chemical vapor deposition
Issue:: Volume 21:Issue 7/9(2015:Sep.)
Page Start:: 161
Record Type:: Journal Article
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9. A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy2. Issue 10 (15th October 2014)

Authors:: Puurunen, Riikka L.
Journal:: Chemical vapor deposition
Issue:: Volume 20:Issue 10/12(2014:Dec.)
Page Start:: 332
Record Type:: Journal Article
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10. A Water‐free Low Temperature Process for Atomic Layer Deposition of Al2O3 Films1. Issue 4 (16th May 2013)

Authors:: Guo, Jiao‐Jiao; Li, Ming‐Da; Sun, Qing‐Qing; Yang, Wen; Zhou, Peng; Ding, Shi‐Jin; Zhang, David Wei; Knez, Mato; Yong, Qin
Journal:: Chemical vapor deposition
Issue:: Volume 19:Issue 4/6(2013:Jun.)
Page Start:: 156
Record Type:: Journal Article
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