1. (Invited) Advanced Semiconductor Devices for Future CMOS Technologies. (27th March 2015) Authors: Claeys, Cor; Chiappe, Danielle; Collaert, Nadine; Mitard, Jerome; Radu, Juliana; Rooyackers, Rita; Simoen, Eddy; Vandooren, Anne; Veloso, Anabela; Waldron, Niamh; Witters, Liesbeth; Thean, Aaron Journal: ECS transactions Issue: Volume 66:Number 5(2015) Page Start: 49 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. (Invited) Challenges on Surface Conditioning in 3D Device Architectures: Triple-Gate FinFETs, Gate-All-Around Lateral and Vertical Nanowire FETs. (15th August 2017) Authors: Veloso, Anabela; Paraschiv, Vasile; Vecchio, Emma; Devriendt, Katia; Li, Waikin; Simoen, Eddy; Chan, B. T.; Tao, Zheng; Rosseel, Erik; Loo, Roger; Milenin, Alexey P.; Kunert, Bernardette; Teugels, Lieve; Sebaai, Farid; Lorant, Christophe; van Dorp, Dennis; Altamirano-Sánchez, Efraín; Brus, Stepha... Journal: ECS transactions Issue: Volume 80:Number 2(2017) Page Start: 3 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. (Invited) Gate-All-Around Nanosheet Field-Effect Transistors for Advanced Logic and Memory Applications: Integration and Device Features. (24th April 2020) Authors: Veloso, Anabela; Matagne, Philippe; Eneman, Geert; Mertens, Hans; Chasin, Adrian; Simoen, Eddy; Horiguchi, Naoto Journal: ECS transactions Issue: Volume 97:Number 1(2020) Page Start: 23 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. (Invited) Gate-All-Around Nanowire FETs vs. Triple-Gate FinFETs: On Gate Integrity and Device Characteristics. (26th April 2016) Authors: Veloso, Anabela; Cho, Moon Ju; Simoen, Eddy; Hellings, Geert; Matagne, Philippe; Collaert, Nadine; Thean, Aaron Journal: ECS transactions Issue: Volume 72:Number 2(2016) Page Start: 85 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. (Invited) Generation-Recombination Noise in Advanced CMOS Devices. (19th August 2016) Authors: Simoen, Eddy; Oliveira, Alberto Vinícius de; Boudier, Dimitri; Mitard, Jerome; Witters, Liesbeth; Veloso, Anabela; Agopian, Paula Ghedini Der; Martino, Joao Antonio; Carin, Regis; Cretu, Bogdan; Langer, Robert; Collaert, Nadine; Thean, Aaron; Claeys, Cor Journal: ECS transactions Issue: Volume 75:Number 5(2016) Page Start: 111 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. (Invited) Heterogeneous Nano- to Wide-Scale Co-Integration of Beyond-Si and Si CMOS Devices to Enhance Future Electronics. (31st March 2015) Authors: Thean, Aaron; Collaert, Nadine; Radu, Iuliana P.; Waldron, Niamh; Merckling, Clement; Witters, Liesbeth; Loo, Roger; Mitard, Jerome; Rooyackers, Rita; Vandooren, Anne; Verhulst, A.; Veloso, Anabela; Yakimets, D.; Bao, T. Huynh; Chiappe, Danielle; Vaysset, A.; Zografos, O.; Caymax, Matty; Huygheba... Journal: ECS transactions Issue: Volume 66:Number 4(2015) Page Start: 3 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. (Invited) Impact of the Metal Gate on the Oxide Stack Quality Assessed by Low-Frequency Noise. (1st August 2017) Authors: Simoen, Eddy; He, Liang; O'Sullivan, Barry; Veloso, Anabela; Horiguchi, Naoto; Collaert, Nadine; Claeys, Cor Journal: ECS transactions Issue: Volume 80:Number 4(2017) Page Start: 69 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. (Invited) Stress Simulations of Fins, Wires, and Nanosheets. (8th September 2020) Authors: Eneman, Geert; Veloso, Anabela; Favia, Paola; Hikavyy, Andriy Yakovitch; Porret, Clement; Arimura, Hiroaki; De Keersgieter, An; Pourtois, Geoffrey; Loo, Roger; Spessot, Alessio; Matagne, Philippe; Ryckaert, J.; Horiguchi, Naoto Journal: ECS transactions Issue: Volume 98:Number 5(2020) Page Start: 253 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. (Invited) Vertical Nanowire FET Integration and Device Aspects. (4th May 2016) Authors: Veloso, Anabela; Altamirano-Sánchez, Efraín; Brus, Stephan; Chan, B. T.; Cupak, Miroslav; Dehan, Morin; Delvaux, Christie; Devriendt, Katia; Eneman, Geert; Ercken, Monique; Huynh-Bao, Trong; Ivanov, Tsvetan; Matagne, Philippe; Merckling, Clement; Paraschiv, Vasile; Ramesh, Siva; Rosseel, Erik; Ry... Journal: ECS transactions Issue: Volume 72:Number 4(2016) Page Start: 31 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. (Keynote) Gate-All-Around Nanowire & Nanosheet FETs for Advanced, Ultra-Scaled Technologies. (24th April 2020) Authors: Veloso, Anabela; Matagne, Philippe; Jang, Doyoung; Huynh-Bao, Trong; Chasin, Adrian; Simoen, Eddy; Eneman, Geert; De Keersgieter, An; Mertens, Hans; Horiguchi, Naoto Journal: ECS transactions Issue: Volume 97:Number 5(2020) Page Start: 3 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗