1. (Et3Si)2Se as a precursor for atomic layer deposition: growth analysis of thermoelectric Bi2Se3. Issue 18 (14th May 2015) Authors: Sarnet, Tiina; Hatanpää, Timo; Vehkamäki, Marko; Flyktman, Timo; Ahopelto, Jouni; Mizohata, Kenichiro; Ritala, Mikko; Leskelä, Markku Journal: Journal of materials chemistry Issue: Volume 3:Issue 18(2015) Page Start: 4820 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. (Invited) Photo-Assisted ALD: Process Development and Application Perspectives. (14th August 2017) Authors: Miikkulainen, Ville; Väyrynen, Katja; Kilpi, Väinö; Han, Zhongmei; Vehkamäki, Marko; Mizohata, Kenichiro; Räisänen, Jyrki; Ritala, Mikko Journal: ECS transactions Issue: Volume 80:Number 3(2017) Page Start: 49 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. A low-temperature thermal ALD process for nickel utilizing dichlorobis(triethylphosphine)nickel(ii) and 1, 4-bis(trimethylgermyl)-1, 4-dihydropyrazine. Issue 29 (6th July 2022) Authors: Vihervaara, Anton; Hatanpää, Timo; Mizohata, Kenichiro; Chundak, Mykhailo; Popov, Georgi; Ritala, Mikko Journal: Dalton transactions Issue: Volume 51:Issue 29(2022) Page Start: 10898 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Alkylsilyl compounds as enablers of atomic layer deposition: analysis of (Et3Si)3As through the GaAs process. Issue 3 (15th December 2015) Authors: Sarnet, Tiina; Hatanpää, Timo; Laitinen, Mikko; Sajavaara, Timo; Mizohata, Kenichiro; Ritala, Mikko; Leskelä, Markku Journal: Journal of materials chemistry Issue: Volume 4:Issue 3(2016) Page Start: 449 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. AlxTayOz Mixture Coatings Prepared Using Atomic Layer Deposition for Corrosion Protection of Steel1. Issue 4 (22nd May 2013) Authors: Härkönen, Emma; Díaz, Belén; Światowska, Jolanta; Maurice, Vincent; Seyeux, Antoine; Fenker, Martin; Tóth, Lajos; Radnóczi, György; Marcus, Philippe; Ritala, Mikko; Knez, Mato; Yong, Qin Journal: Chemical vapor deposition Issue: Volume 19:Issue 4/6(2013:Jun.) Page Start: 194 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films. (1st January 2018) Authors: Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 5(2018) Page Start: P287 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Films. (24th May 2018) Authors: Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Heikkilä, Mikko J.; Ritala, Mikko; Leskelä, Markku Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 5(2018) Page Start: P287 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates. (1st January 2018) Authors: Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 9(2018) Page Start: P501 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminates. (6th September 2018) Authors: Kukli, Kaupo; Kemell, Marianna; Castán, Helena; Dueñas, Salvador; Seemen, Helina; Rähn, Mihkel; Link, Joosep; Stern, Raivo; Ritala, Mikko; Leskelä, Markku Journal: ECS journal of solid state science and technology Issue: Volume 7:Number 9(2018) Page Start: P501 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Atomic Layer Deposition of 2D Metal Dichalcogenides for Electronics, Catalysis, Energy Storage, and Beyond. Issue 6 (18th January 2021) Authors: Mattinen, Miika; Leskelä, Markku; Ritala, Mikko Journal: Advanced materials interfaces Issue: Volume 8:Issue 6(2021) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗