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You searched for: Author/Creator Kunitake, Hitoshi

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1. (Invited) Display and LSI Applications of Oxide Semiconductor LSIs (OS LSIs) Using Crystalline In–Ga–Zn Oxide (IGZO): Applications Related to Coronavirus COVID-19 Pandemic. (8th September 2020)

2. 10‐1: Layout of 1.50‐inch, 3207‐ppi OLED Display with OSLSI/SiLSI Structure Capable of Division Driving Fabricated through VLSI Process with Side‐by‐Side Patterning by Photolithography. Issue 1 (28th June 2022)

3. 16‐1: Low‐Power Oxide‐Semiconductor Display System. Issue 1 (2nd June 2017)

4. 16‐1: Low‐Power Oxide‐Semiconductor Display System. Issue 1 (May 2017)

6. 32‐1: Oxide Semiconductor Field‐Effect Transistor for High‐Resolution Displays Capable of Deep Black Display. Issue 1 (28th June 2022)

7. 32‐3: 1.5‐inch, 3207‐ppi Side‐by‐Side OLED Display Capable of 32‐Division Driving with OSLSI/SiLSI Structure Fabricated by Photolithography. Issue 1 (28th June 2022)

8. 5, 291‐ppi OLED display enabled by monolithic integration of C‐axis‐aligned crystalline IGZO FET and Si CMOS. Issue 9 (7th July 2022)

9. 9‐1: Evaluation of X‐ray Resistance of Submicron‐Size c‐Axis Aligned Crystalline‐Oxide Semiconductor. Issue 1 (28th June 2022)

10. Characteristics and Applications of CAAC-IGZO FET with Gate Length of 13nm. (8th September 2020)