1. Design for manufacturability with advanced lithography. (2016) Authors: Yu, Bei; Pan, David Z Record Type: Book Extent: 1 online resource View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Materials and processes for next generation lithography. (2016) Editors: Robinson, Alex; Lawson, Richard Record Type: Book Extent: 1 online resource View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Microlithography fundamentals in semiconductor devices and fabrication technology. (2018) Authors: Nonogaki, Saburo, 1930-; Itō, Toshio; Ueno, Takumi, 1951- Record Type: Book Extent: 1 online resource (v, 327 pages), illustrations View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Photopolymers : photoresist materials, processes, and applications /: photoresist materials, processes, and applications. (2014) Authors: (Chemical engineer), Nakamura, Kenichiro Record Type: Book Extent: 1 online resource, illustrations (black and white) View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Photopolymers : photoresist materials, processes, and applications /: photoresist materials, processes, and applications. (2018) Authors: (Chemical engineer), Nakamura, Kenichiro Record Type: Book Extent: 1 online resource (189 pages), (44 illustrations) View Content: Available online (eLD content is only available in our Reading Rooms) ↗