Photopolymers : photoresist materials, processes, and applications /: photoresist materials, processes, and applications. (2018)

• Record Type: Book
• Further Information: Note: Kenichiro Nakamura.
• Authors: (Chemical engineer), Nakamura, Kenichiro
• Contents: Introduction About the Author Basic Idea of Photopolymerization Introduction Radical Polymerization Monomers for Photopolymerization Initiators of Photopolymerization Inhibition of Polymerization Cationic Photopolymerization Photocrosslinking Scission of Polymers References Chemically Amplified Resists Introduction Chemical Amplification of Photopolymers Polymers for Chemical Amplification Photoacid Generator References Process of Chemically Amplified Resists Introduction Progress of Resolution Limit Immersion Lithography Double Patterning EUV Lithography Direct Self-Assembly (DSA) References Nanoimprinting Introduction Thermal Nanoimprinting UV Nanoimprinting Cationic Polymerization of UV Nanoimprinting Ene-Thiol Polymerization of UV Nanoimprinting Soft Lithography References Industrial Applications of Photopolymers Introduction Application to Electronics Optical Adhesive Polymers Holographic Photopolymers Application to Medical Materials Microelectromechanical Systems (MEMS) References
• Publisher Details: Place of publication not identified : CRC Press
• Publication Date: 2018
• Extent: 1 online resource (189 pages), (44 illustrations)
• Subjects: 620.19204295; Photopolymers; Photoresists; Photopolymerization; Photopolymers -- Industrial applications; Microelectronics -- Materials
• Languages: English
• ISBNs: 9781351832229; 1351832220
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.