Microlithography fundamentals in semiconductor devices and fabrication technology. (2018)

• Record Type: Book
• Further Information: Note: By Saburo Nonogaki, Ueno Takumi and Toshio Ito.
• Authors: Nonogaki, Saburo, 1930-; Itō, Toshio; Ueno, Takumi, 1951-
• Contents: Chapter 1 Introduction -- chapter 2 Exposure Systems in Photolithography -- chapter 3 Optical Pattern Transfer -- chapter 4 Chemistry of Photoresist Materials -- chapter 5 Practical Processes in Microlithography -- chapter 6 X-ray Lithography -- chapter 7 Electron Beam Lithography -- chapter 8 Variations in the Microlithographic Process.
• Publisher Details: Boca Raton, FL : CRC Press
• Publication Date: 2018
• Copyright Date: 1998
• Extent: 1 online resource (v, 327 pages), illustrations
• Subjects: 621.38152; Manufacturing processes; Microlithography -- Industrial applications; Photoresists; Semiconductors -- Design and construction; TECHNOLOGY & ENGINEERING -- Nanotechnology & MEMS; TECHNOLOGY & ENGINEERING -- Mechanical; Manufacturing processes; Microlithography -- Industrial applications; Photoresists; Semiconductors -- Design and construction; Electronic books
• Languages: English
• ISBNs: 9781482273762; 1482273764
• Related ISBNs: 9780824799519; 0824799518
• Notes: Note: Includes bibliographical references and index.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.