Design for manufacturability with advanced lithography. (2016)

• Record Type: Book
• Further Information: Note: Bei Yu and David Z. Pan.
• Authors: Yu, Bei; Pan, David Z
• Contents: Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-
• Publisher Details: Cham : Springer
• Publication Date: 2016
• Extent: 1 online resource
• Subjects: 621.3815; Engineering; Integrated circuits -- Design and construction; Photoresists; Lithography; TECHNOLOGY & ENGINEERING -- Mechanical; Integrated circuits -- Design and construction; Lithography; Photoresists; Engineering; Circuits and Systems; Processor Architectures; Electronics and Microelectronics, Instrumentation; Computers -- Systems Architecture -- General; Technology & Engineering -- Electronics -- General; Computer architecture & logic design; Electronics engineering; Systems engineering; Computer science; Electronics; Technology & Engineering -- Electronics -- Circuits -- General; Circuits & components; Electronic books
• Languages: English
• ISBNs: 9783319203850; 3319203851
• Related ISBNs: 9783319203843; 3319203843
• Notes: Note: Includes bibliographical references and index.; Note: Online resource; title from PDF title page (EBSCO, viewed November 2, 2015).
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.