Materials and processes for next generation lithography. (2016)

• Record Type: Book
• Further Information: Note: Volume editor, Alex Robinson, Richard Lawson.
• Editors: Robinson, Alex; Lawson, Richard
• Contents: Chapter 1: Overview of Materials and Processes for Lithography Richard A Lawson Chapter 2: Molecular Excitation and Relaxation of Extreme Ultraviolet Lithography Photoresists Frank Ogletree Chapter 3: Theory: electron-induced chemistry W.F. van Dorp Chapter 4: EUV Lithography Process Challenges Elizabeth Buitrago Chapter 5: EUV Lithography Patterning Challenges Patrick Naulleau Chapter 6: The Chemistry and Application of Non-Chemically Amplified (Non-CA) Chain-scission Resists Andrew Whittaker Chapter 7: Chemically Amplified Resists and Acid Amplifiers Jim Thackeray Chapter 8: Negative tone organic molecular resists Richard A Lawson Chapter 9: Positive molecular resists Panagiotis Argitis Chapter 10: Mainstreaming Inorganic Metal Oxide Resists for High-Resolution Lithography Deirdre Olynick; Douglas Keszler Chapter 11: Molecular Organometallic Resists for EUV Brian Cardineau Chapter 12: SML Electron Beam Resist: Ultra High Aspect Ratio Nanolithography Scott Lewis Chapter 13: Alternative Resist Approaches Alex Robinson Chapter 14: Next Generation Lithography - the rise of unconventional methods? Marcus Kästner Chapter 15: Tip-based nanolithography methods and materials Yana Krivoshapkina Chapter 16 Thermal scanning probe lithography Philip Paul Chapter 17 Scanning Helium Ion Beam Lithography Stuart Boden
• Publisher Details: Amsterdam : Elsevier
• Publication Date: 2016
• Extent: 1 online resource
• Subjects: 621.38153; Microlithography; Photoresists
• Languages: English
• ISBNs: 9780081003589
• Related ISBNs: 9780081003541
• Notes: Note: Description based on CIP data; item not viewed.
• Access Rights: Legal Deposit; Only available on premises controlled by the deposit library and to one user at any one time; The Legal Deposit Libraries (Non-Print Works) Regulations (UK).
• Access Usage: Restricted: Printing from this resource is governed by The Legal Deposit Libraries (Non-Print Works) Regulations (UK) and UK copyright law currently in force.