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You searched for: Author/Creator Samavedam, Srikanth

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2. Dual-curvature cavity for improved p-type FinFET performance. (13th July 2018)

3. Effective work-function control technique applicable to p-type FinFET high-k/metal gate devices. (May 2017)

4. Source/drain eSiGe engineering for FinFET technology. (17th August 2017)

5. Trade-Off between Gate Oxide Integrity and Transistor Performance for FinFET Technology. (1st January 2017)

6. Trade-Off between Gate Oxide Integrity and Transistor Performance for FinFET Technology. (3rd August 2017)