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Author/Creator Guo, Yutuo

1. Chemical Vapor Deposition of 4 Inch Wafer‐Scale Monolayer MoSe2. Issue 11 (20th September 2022)

Authors:
Li, Jiawei; Wang, Shuopei; Li, Lu; Wei, Zheng; Wang, Qinqin; Sun, Huacong; Tian, Jinpeng; Guo, Yutuo; Liu, Jieying; Yu, Hua; Li, Na; Long, Gen; Bai, Xuedong; Yang, Wei; Yang, Rong; Shi, Dongxia; Zhang, Guangyu
Journal:
Small science
Issue:
Volume 2:Issue 11(2022)
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Journal Article
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2. Highly Stretchable MoS2‐Based Transistors with Opto‐Synaptic Functionalities (Adv. Electron. Mater. 9/2022). (7th September 2022)

Authors:
Li, Jiawei; Li, Na; Wang, Qinqin; Wei, Zheng; He, Congli; Shang, Dashan; Guo, Yutuo; Zhang, Woyu; Tang, Jian; Liu, Jieying; Wang, Shuopei; Yang, Wei; Yang, Rong; Shi, Dongxia; Zhang, Guangyu
Journal:
Advanced Electronic Materials
Issue:
Volume 8:Number 9(2022)
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Journal Article
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3. Highly Stretchable MoS2‐Based Transistors with Opto‐Synaptic Functionalities. (15th May 2022)

Authors:
Li, Jiawei; Li, Na; Wang, Qinqin; Wei, Zheng; He, Congli; Shang, Dashan; Guo, Yutuo; Zhang, Woyu; Tang, Jian; Liu, Jieying; Wang, Shuopei; Yang, Wei; Yang, Rong; Shi, Dongxia; Zhang, Guangyu
Journal:
Advanced Electronic Materials
Issue:
Volume 8:Number 9(2022)
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Journal Article
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4. In Situ Oxygen Doping of Monolayer MoS2 for Novel Electronics. Issue 42 (17th September 2020)

Authors:
Tang, Jian; Wei, Zheng; Wang, Qinqin; Wang, Yu; Han, Bo; Li, Xiaomei; Huang, Biying; Liao, Mengzhou; Liu, Jieying; Li, Na; Zhao, Yanchong; Shen, Cheng; Guo, Yutuo; Bai, Xuedong; Gao, Peng; Yang, Wei; Chen, Lan; Wu, Kehui; Yang, Rong; Shi, Dongxia
Journal:
Small
Issue:
Volume 16:Issue 42(2020)
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Journal Article
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5. Layer-by-layer epitaxy of multi-layer MoS2 wafers. Issue 6 (21st April 2022)

Authors:
Wang, Qinqin; Tang, Jian; Li, Xiaomei; Tian, Jinpeng; Liang, Jing; Li, Na; Ji, Depeng; Xian, Lede; Guo, Yutuo; Li, Lu; Zhang, Qinghua; Chu, Yanbang; Wei, Zheng; Zhao, Yanchong; Du, Luojun; Yu, Hua; Bai, Xuedong; Gu, Lin; Liu, Kaihui; Yang, Wei
Journal:
National science review
Issue:
Volume 9:Issue 6(2022)
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Journal Article
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6. Scratching lithography for wafer-scale MoS2 monolayers. (17th September 2020)

Authors:
Wei, Zheng; Liao, Mengzhou; Guo, Yutuo; Tang, Jian; Cai, Yongqing; Chen, Hanyang; Wang, Qinqin; Jia, Qi; Lu, Ying; Zhao, Yanchong; Liu, Jieying; Chu, Yanbang; Yu, Hua; Li, Na; Yuan, Jiahao; Huang, Biying; Shen, Cheng; Yang, Rong; Shi, Dongxia; Zhang, Guangyu
Journal:
2D materials
Issue:
Volume 7:Number 4(2020)
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Journal Article
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7. Substitutional Doping: In Situ Oxygen Doping of Monolayer MoS2 for Novel Electronics (Small 42/2020). Issue 42 (22nd October 2020)

Authors:
Tang, Jian; Wei, Zheng; Wang, Qinqin; Wang, Yu; Han, Bo; Li, Xiaomei; Huang, Biying; Liao, Mengzhou; Liu, Jieying; Li, Na; Zhao, Yanchong; Shen, Cheng; Guo, Yutuo; Bai, Xuedong; Gao, Peng; Yang, Wei; Chen, Lan; Wu, Kehui; Yang, Rong; Shi, Dongxia
Journal:
Small
Issue:
Volume 16:Issue 42(2020)
Page Start:
n/a
Record Type:
Journal Article
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