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MLA Citation
You-Hang 有航 Wang 王 et al.. “Influence of Post-Annealing on Electrical Characteristics of Thin-Film Transistors with Atomic-Layer-Deposited ZnO-Channel/Al2O3-Dielectric*Supported by the National Natural Science Foundation of China under Grant Nos 61474027 and 61376008..” Chinese physics letters, vol. 33, n.d., p. . http://access.bl.uk/ark:/81055/vdc_100036337848.0x00002a