1. (Invited) Process and Integration of Dielectrics Required for 10nm and Beyond Scaling. (26th April 2016) Authors: Clark, Robert D.; Tapily, Kandabara; Consiglio, Steven; Hakamata, Takahiro; O'Meara, David; Newman, Daniel; Collings, Michael; Szymanski, Dennis; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 72:Number 2(2016) Page Start: 319 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Atomic Layer Deposition of Ultrathin TaN and Ternary Ta1-XAlXNy Films for Cu Diffusion Barrier Applications in Advanced Interconnects. (10th September 2015) Authors: Consiglio, Steven; Yu, Kyle; Dey, Sonal; Tapily, Kandabara; Clark, Robert D.; Hasegawa, Toshio; Wajda, Cory S.; Leusink, Gert J.; Diebold, Alain C. Journal: ECS transactions Issue: Volume 69:Number 7(2015) Page Start: 181 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Bilayer Dielectrics for RRAM Devices. (20th July 2018) Authors: Misra, Durgamadhab; Sultana, Sabiha; Jain, Barsha; Bhat, Navakanta; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 86:Number 2(2018) Page Start: 77 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Effect of Post Plasma Oxidation on Ge Gate Stacks Interface Formation. (4th May 2016) Authors: Mukhopadhyay, Sromana; Mitra, Shilpa; Ding, YI Ming; Ganapathi, K.L.; Misra, Durga; Bhat, Navakanta; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 72:Number 4(2016) Page Start: 303 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Electrical Characterization of Dry and Wet Processed Interface Layer in Ge/High-K Devices. (8th September 2015) Authors: Ding, YI Ming; Misra, Durga; Bhuyian, Mdnasiruddin; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 69:Number 5(2015) Page Start: 313 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Electrically Scaled Hafnium Oxide Based Ge Devices. (19th August 2016) Authors: Tapily, Kandabara; Dey, Sonal; Consiglio, Steven; Clark, Robert D.; Wajda, Cory S.; Leusink, Gert J.; Diebold, Alain C. Journal: ECS transactions Issue: Volume 75:Number 5(2016) Page Start: 135 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Higher-k Tetragonal Phase Stabilization in Atomic Layer Deposited Hf1-xZrxO2 (0<x<1) Thin Films on Al2O3 Passivated Epitaxial-Ge. Issue 4 (2016) Authors: Dey, Sonal; Tapily, Kandabara; Consiglio, Steven; Yu, Kai-Hung; Clark, Robert D.; Wajda, Cory S.; Leusink, Gert J.; Woll, Arthur R.; Diebold, Alain C. Journal: MRS advances Issue: Volume 1:Issue 4(2016) Page Start: 269 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Multilevel Resistive Switching in Hf-Based RRAM. (23rd April 2019) Authors: Jain, Barsha; Huang, Chia-sheng; Misra, Durgamadhab; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 89:Number 3(2019) Page Start: 39 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Process Dependent Optimization of Dielectric and Metal Stacks for Multilevel Resistive Random-Access Memory. (24th April 2020) Authors: Zhao, Pengxiang; Misra, Durga; Triyoso, Dina; Kaushik, Vidya; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 97:Number 3(2020) Page Start: 13 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Reliability of Post Plasma Oxidation Processed ALD Al2O3/Hf1-xZrxO2 Thin Films on Ge Substrates. (18th April 2017) Authors: Bhuyian, Md Nasir Uddin; Sengupta, Arijit; Ding, Yiming; Misra, Durga; Tapily, Kandabara; Clark, Robert D.; Consiglio, Steven; Wajda, Cory S.; Leusink, Gert J. Journal: ECS transactions Issue: Volume 77:Number 2(2017) Page Start: 99 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗