1. Androgen induces gonadal soma-derived factor, Gsdf, in XX gonads correlated to sex-reversal but not Dmrt1 directly, in the teleost fish, northern medaka (Oryzias sakaizumii). (15th November 2016) Authors: Horie, Yoshifumi; Myosho, Taijun; Sato, Tadashi; Sakaizumi, Mitsuru; Hamaguchi, Satoshi; Kobayashi, Tohru Journal: Molecular and cellular endocrinology Issue: Volume 436(2016) Page Start: 141 Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
2. Atmospheric-pressure plasma-irradiation inhibits mouse embryonic stem cell differentiation to mesoderm and endoderm but promotes ectoderm differentiation. (21st March 2016) Authors: Miura, Taichi; Hamaguchi, Satoshi; Nishihara, Shoko Journal: Journal of physics Issue: Volume 49:Number 16(2016) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
3. Cyclic etching of tin-doped indium oxide using hydrogen-induced modified layer. (22nd May 2018) Authors: Hirata, Akiko; Fukasawa, Masanaga; Nagahata, Kazunori; Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi; Tatsumi, Tetsuya Journal: Japanese journal of applied physics Issue: Volume 57:Number 6(2018)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
4. Damage recovery and low‐damage etching of ITO in H2/CO plasma: Effects of hydrogen or oxygen. Issue 9 (24th April 2019) Authors: Hirata, Akiko; Fukasawa, Masanaga; Kugimiya, Katsuhisa; Karahashi, Kazuhiro; Hamaguchi, Satoshi; Nagaoka, Kojiro Other Names: Hamaguchi Satoshi guestEditor.; Agarwal Sumit guestEditor.; Zajickova Lenka guestEditor. Journal: Plasma processes and polymers Issue: Volume 16:Issue 9(2019) Page Start: n/a Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
5. Editorial for achieving atomistic control in plasma–material interactions. (15th November 2017) Authors: Oehrlein, Gottlieb S; Hamaguchi, Satoshi; Von Keudell, Achim Journal: Journal of physics Issue: Volume 50:Number 49(2017) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
6. Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma. (22nd May 2017) Authors: Hirata, Akiko; Fukasawa, Masanaga; Shigetoshi, Takushi; Okamoto, Masaki; Nagahata, Kazunori; Li, Hu; Karahashi, Kazuhiro; Hamaguchi, Satoshi; Tatsumi, Tetsuya Journal: Japanese journal of applied physics Issue: Volume 56:Number 6(2017)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
7. Enhanced etching of tin-doped indium oxide due to surface modification by hydrogen ion injection. (29th May 2018) Authors: Li, Hu; Karahashi, Kazuhiro; Friederich, Pascal; Fink, Karin; Fukasawa, Masanaga; Hirata, Akiko; Nagahata, Kazunori; Tatsumi, Tetsuya; Wenzel, Wolfgang; Hamaguchi, Satoshi Journal: Japanese journal of applied physics Issue: Volume 57:Number 6(2018)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
8. Etching yields and surface reactions of amorphous carbon by fluorocarbon ion irradiation. (31st May 2017) Authors: Karahashi, Kazuhiro; Li, Hu; Yamada, Kentaro; Ito, Tomoko; Numazawa, Satoshi; Machida, Ken; Ishikawa, Kiyoshi; Hamaguchi, Satoshi Journal: Japanese journal of applied physics Issue: Volume 56:Number 6(2017)Supplement 2 Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
9. Five-step plasma-enhanced atomic layer etching of silicon nitride with a stable etched amount per cycle. (1st June 2022) Authors: Hirata, Akiko; Fukasawa, Masanaga; Tercero, Jomar U.; Kugimiya, Katsuhisa; Hagimoto, Yoshiya; Karahashi, Kazuhiro; Hamaguchi, Satoshi; Iwamoto, Hayato Journal: Japanese journal of applied physics Issue: Volume 61:Number 6(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗
10. Foundations of atomic-level plasma processing in nanoelectronics. (1st October 2022) Authors: Arts, Karsten; Hamaguchi, Satoshi; Ito, Tomoko; Karahashi, Kazuhiro; Knoops, Harm C M; Mackus, Adriaan J M; (Erwin) Kessels, Wilhelmus M M Journal: Plasma sources science & technology Issue: Volume 31:Number 10(2022) Page Start: Record Type: Journal Article View Content: Available online (eLD content is only available in our Reading Rooms) ↗