Characterization and compact modeling of short channel MOSFETs at cryogenic temperatures. (June 2023)
- Record Type:
- Journal Article
- Title:
- Characterization and compact modeling of short channel MOSFETs at cryogenic temperatures. (June 2023)
- Main Title:
- Characterization and compact modeling of short channel MOSFETs at cryogenic temperatures
- Authors:
- Huang, Jixiang
Zhang, Yuanke
Chen, Yuefeng
Xu, Jun
Luo, Chao
Guo, Guoping - Abstract:
- Abstract: This paper presents an overall characterization, physics-based device analysis, and compact modeling of a commercial 110 nm bulk CMOS technology. I − V measurements and DC parameters extraction are performed on low threshold voltage (low V T H, LVT) and regular V T H (RVT) devices with various geometry dimensions from 300 K to 6 K. Different levels of improvement of subthreshold swing ( S S ), OFF -state current ( I O F F ), and mobility indicates the potential to optimize the performance of circuits at cryogenic temperatures. However, the temperature characteristics of the mobility and series resistance show a great dependence on the channel length of the devices, which complicates the calculation of the ON -state current at cryogenic temperatures. Moreover, V T H roll-off caused by short channel effect (SCE) get worse, which can be attributed to the increased bulk Fermi potential ( ϕ f ). These channel-length-related effects add extra challenges to the design of cryogenic circuits. An optimized compact model based on BSIM4 is proposed to capture the device characteristics at 6 K, which can produce accurate simulation results only through parameter configuration rather than model equation modification and has been applied to the design of cryogenic CMOS circuits. Highlights: The cryogenic characterization of Nexchip 110 nm CMOS technology is presented. Mobility collapse, threshold voltage roll-up and roll-off are investigated at 6 K. A compact model that canAbstract: This paper presents an overall characterization, physics-based device analysis, and compact modeling of a commercial 110 nm bulk CMOS technology. I − V measurements and DC parameters extraction are performed on low threshold voltage (low V T H, LVT) and regular V T H (RVT) devices with various geometry dimensions from 300 K to 6 K. Different levels of improvement of subthreshold swing ( S S ), OFF -state current ( I O F F ), and mobility indicates the potential to optimize the performance of circuits at cryogenic temperatures. However, the temperature characteristics of the mobility and series resistance show a great dependence on the channel length of the devices, which complicates the calculation of the ON -state current at cryogenic temperatures. Moreover, V T H roll-off caused by short channel effect (SCE) get worse, which can be attributed to the increased bulk Fermi potential ( ϕ f ). These channel-length-related effects add extra challenges to the design of cryogenic circuits. An optimized compact model based on BSIM4 is proposed to capture the device characteristics at 6 K, which can produce accurate simulation results only through parameter configuration rather than model equation modification and has been applied to the design of cryogenic CMOS circuits. Highlights: The cryogenic characterization of Nexchip 110 nm CMOS technology is presented. Mobility collapse, threshold voltage roll-up and roll-off are investigated at 6 K. A compact model that can precisely describe the devices at 6 K is proposed. … (more)
- Is Part Of:
- Solid-state electronics. Volume 204(2023)
- Journal:
- Solid-state electronics
- Issue:
- Volume 204(2023)
- Issue Display:
- Volume 204, Issue 2023 (2023)
- Year:
- 2023
- Volume:
- 204
- Issue:
- 2023
- Issue Sort Value:
- 2023-0204-2023-0000
- Page Start:
- Page End:
- Publication Date:
- 2023-06
- Subjects:
- Cryogenic MOSFET -- Characterization -- Mobility -- Short channel effect -- Modeling -- BSIM4
Semiconductors -- Periodicals
Semiconducteurs -- Périodiques
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00381101 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.sse.2023.108637 ↗
- Languages:
- English
- ISSNs:
- 0038-1101
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 8327.385000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 27019.xml