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APA Citation
Termo, G., Borghello, G., Faccio, F., Michelis, S., Koukab, A., & Sallese, J. (2023). fab-to-fab and run-to-run variability in 130 nm and 65 nm CMOS technologies exposed to ultra-high TID. Journal of instrumentation, 18, . http://access.bl.uk/ark:/81055/vdc_100176520174.0x000019