Cite
APA Citation
Kobayashi, M. (2018). (Invited) Technology Breakthrough by Ferroelectric HfO2 for Low Power Logic and Memory Applications. ECS transactions, 86, 21–25. http://access.bl.uk/ark:/81055/vdc_100117134216.0x000013
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Kobayashi, M. (2018). (Invited) Technology Breakthrough by Ferroelectric HfO2 for Low Power Logic and Memory Applications. ECS transactions, 86, 21–25. http://access.bl.uk/ark:/81055/vdc_100117134216.0x000013