Cite
HARVARD Citation
Kobayashi, M. (2018). (Invited) Technology Breakthrough by Ferroelectric HfO2 for Low Power Logic and Memory Applications. ECS transactions. pp. 21-25. [Online].
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Kobayashi, M. (2018). (Invited) Technology Breakthrough by Ferroelectric HfO2 for Low Power Logic and Memory Applications. ECS transactions. pp. 21-25. [Online].