Cite
APA Citation
Wen, T., Ni, B., Liu, Y., Zhang, W., Guo, Z., Lee, Y., Ho, R., & Cheng, S. Z. (2021). towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing. Giant, 8, . http://access.bl.uk/ark:/81055/vdc_100166746738.0x000003