Towards achieving a large-area and defect-free nano-line pattern via controlled self-assembly by sequential annealing. (December 2021)

• Record Type: Journal Article
• Authors: Wen, Tao; Ni, Bo; Liu, Yuchu; Zhang, Wei; Guo, Zi-Hao; Lee, Yi-Chien; Ho, Rong-Ming; Cheng, Stephen Z.D.
• Is Part Of: Giant. Volume 8(2021)
• Publication Date: 2021-12
• Subjects: Giant surfactant -- Self-assembly -- Nano-patterning -- Thin film; Macromolecules -- Periodicals; Nanostructured materials -- Periodicals; Smart materials -- Periodicals; Biomimetic materials -- Periodicals; Nanostructures; Smart Materials; Biomimetic Materials; Macromolecular Substances; Biomimetic materials; Macromolecules; Nanostructured materials; Smart materials; Electronic journals; Periodical; Periodicals; 547.7
• DOI: 10.1016/j.giant.2021.100078
• Languages: English
• ISSNs: 2666-5425

Abstract

Abstract: Utilizing the controlled self-assembling of a giant surfactant, a bottom-up method for constructing line gratings with sub-10 nm resolution has been developed. Via a simple solvent vapor annealing procedure, the giant surfactant comprised of an oligomeric silsesquioxane (DPOSS) and polystyrene (PS) tail ( i.e., DPOSS-PS) has been precisely self-assembled into perpendicularly oriented lamellae structures. A follow-up thermal annealing further significantly promotes the long-range ordering, giving rise to highly oriented and defect-free sub-10 nm line patterns (up to areas of several µm 2 ). The solvent evaporation and thermal annealing process, together with the strong segregation strength ( χN ) of DPOSS-PS, play crucial roles in the self-orientation and width-reduction of the line patterns. This simple processing of the easy-accessed giant surfactants results in a facile and more economic approach for large-scale nano-sized line grating fabrication. Graphical abstract: Image, graphical abstract