Cite
MLA Citation
Haruo Sudo et al.. “Point Defect Reaction in Silicon Wafers by Rapid Thermal Processing at More Than 1300°C Using an Oxidation Ambient.” ECS journal of solid state science and technology, vol. 8, 2019, pp. P35–P40. http://access.bl.uk/ark:/81055/vdc_100160141538.0x00000b