Cite
APA Citation
Li, J., Kim, S. J., Han, S., Kim, Y., & Chae, H. (2021). etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas. Plasma processes and polymers, 18(11), n/a. http://access.bl.uk/ark:/81055/vdc_100145493290.0x000024