Cite
HARVARD Citation
Li, J. et al. (2021). Etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas. Plasma processes and polymers. 18 (11), p. n/a. [Online].
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Li, J. et al. (2021). Etching characteristics of hydrogenated amorphous carbon with different sp2/sp3 hybridization ratios in CF4/O2 plasmas. Plasma processes and polymers. 18 (11), p. n/a. [Online].