Si wire array waveguide grating with stray light reduction scheme fabricated by ArF excimer immersion lithography. Issue 22 (1st October 2013)

• Record Type: Journal Article
• Authors: Okayama, H.; Shimura, D.; Onawa, Y.; Takahashi, H.; Seki, M.; Koshino, K.; Yokoyama, N.; Oshtsuka, M.; Tsuchizawa, T.; Nishi, H.; Yamada, K.; Yaegashi, H.; Horikawa, T.; Sasaki, H.
• Is Part Of: Electronics letters. Volume 49:Issue 22(2013)
• Page Start: 1401
• Page End: 1402
• Publication Date: 2013-10-01
• Subjects: arrayed waveguide gratings -- channel spacing -- elemental semiconductors -- immersion lithography -- optical crosstalk -- optical design techniques -- optical fabrication -- silicon -- stray light; wire array waveguide grating -- stray light reduction -- ArF excimer immersion lithography -- noise reduction -- transmission peak width -- curved waveguides -- slab waveguide structure -- channel spacing -- crosstalk -- frequency 200 GHz -- Si; Electronics -- Periodicals; 621.381
• DOI: 10.1049/el.2013.2979
• Languages: English
• ISSNs: 0013-5194

Abstract

Abstract : A Si wire arrayed waveguide grating designed to reduce the noise and transmission peak width and avoid systematic phase error generated at the curved waveguides is reported. A slab waveguide structure to remove stray light is used. 200 GHz spacing 16 channel devices were fabricated by ArF immersion. An improved crosstalk of −23 dB was obtained.