Cite
HARVARD Citation
Lee, R. et al. (2015). (Invited) Technology Options to Reduce Contact Resistance in Nanoscale III-V MOSFETs. ECS transactions. pp. 125-134. [Online].
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Lee, R. et al. (2015). (Invited) Technology Options to Reduce Contact Resistance in Nanoscale III-V MOSFETs. ECS transactions. pp. 125-134. [Online].