Cite
HARVARD Citation
Clemente, I. et al. (2016). CF3Br plasma cryo etching of low-k porous dielectric. Journal of physics. p. . [Online].
This is an interim version of our Electronic Legal Deposit Catalogue-eJournals and eBooks while we continue to recover from a cyber-attack.
Clemente, I. et al. (2016). CF3Br plasma cryo etching of low-k porous dielectric. Journal of physics. p. . [Online].