Cite
MLA Citation
Artur Böttcher et al.. “Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam.” Nanotechnology, vol. 31, 2020, p. . http://access.bl.uk/ark:/81055/vdc_100111734004.0x000041
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Artur Böttcher et al.. “Nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam.” Nanotechnology, vol. 31, 2020, p. . http://access.bl.uk/ark:/81055/vdc_100111734004.0x000041