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APA Citation

    Böttcher, A., Schwaiger, R., Pazdera, T. M., Exner, D., Hauns, J., Strelnikov, D., Lebedkin, S., Gröger, R., Esch, F., Lechner, B. A. J., & Kappes, M. M. (2020). nanoscale patterning at the Si/SiO2/graphene interface by focused He+ beam. Nanotechnology, 31, . http://access.bl.uk/ark:/81055/vdc_100111734004.0x000041
  
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