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APA Citation
Park, S., Kyung, Y., Lee, J., Jang, Y., Cha, T., Noh, Y., Choi, Y., Kim, B., Cho, T., Seo, R., Yang, J., Jang, Y., Ryu, S., & Kim, G. (2019). cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing. Plasma processes and polymers, 16(9), n/a. http://access.bl.uk/ark:/81055/vdc_100091287044.0x00000f