Cite
MLA Citation
Zhen Zhu et al.. “Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications.” Physica status solidi, vol. 217, no. 8, 2020, p. n/a. http://access.bl.uk/ark:/81055/vdc_100103167832.0x000015