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APA Citation
Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J., & Savin, H. (2020). al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications. Physica status solidi, 217(8), n/a. http://access.bl.uk/ark:/81055/vdc_100103167832.0x000015