Cite
HARVARD Citation
Zhu, Z. et al. (2020). Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications. Physica status solidi. 217 (8), p. n/a. [Online].
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Zhu, Z. et al. (2020). Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications. Physica status solidi. 217 (8), p. n/a. [Online].