Cite
MLA Citation
Béatrice Plujat et al.. “SiCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits.” Plasma processes and polymers, vol. 17, no. 1, 2020, p. n/a. http://access.bl.uk/ark:/81055/vdc_100098795435.0x00001a