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APA Citation
Plujat, B., Glénat, H., Bousquet, A., Frézet, L., Hamon, J., Goullet, A., Tomasella, É., Hernandez, E., Quoizola, S., & Thomas, L. (2020). siCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma processes and polymers, 17(1), n/a. http://access.bl.uk/ark:/81055/vdc_100098795435.0x00001a