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HARVARD Citation
Plujat, B. et al. (2020). SiCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma processes and polymers. 17 (1), p. n/a. [Online].
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Plujat, B. et al. (2020). SiCN:H thin films deposited by MW‐PECVD with liquid organosilicon precursor: Gas ratio influence versus properties of the deposits. Plasma processes and polymers. 17 (1), p. n/a. [Online].