Cite
MLA Citation
Vitor R. Manfrinato et al.. “1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019).” Advanced functional materials, vol. 29, 2019, p. n/a. http://access.bl.uk/ark:/81055/vdc_100098638939.0x000025