Cite
HARVARD Citation
Manfrinato, V. et al. (2019). 1‐nm Si Patterning: Patterning Si at the 1 nm Length Scale with Aberration‐Corrected Electron‐Beam Lithography: Tuning of Plasmonic Properties by Design (Adv. Funct. Mater. 52/2019). Advanced functional materials. p. n/a. [Online].