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APA Citation
Ichikawa, T., Yagisawa, T., Furukawa, S., Taguchi, T., Nojima, S., Murakami, S., & Tamaoki, N. (n.d.). cooperative simulation of lithography and topography for three-dimensional high-aspect-ratio etching. Japanese journal of applied physics, 57, . http://access.bl.uk/ark:/81055/vdc_100087555395.0x000063