Cite
APA Citation
Kawabata, K., & Muto, T. (1981). electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. Electrocomponent science and technology, 8, 249. http://access.bl.uk/ark:/81055/vdc_100082242184.0x00005a
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Kawabata, K., & Muto, T. (1981). electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. Electrocomponent science and technology, 8, 249. http://access.bl.uk/ark:/81055/vdc_100082242184.0x00005a