Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. (1981)

Record Type:: Journal Article
Title:: Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. (1981)
Main Title:: Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering
Authors:: Kawabata, K.
Muto, T.
Abstract:
Is Part Of:: Electrocomponent science and technology. Volume 8:Number 3/4(1981)
Journal:: Electrocomponent science and technology
Issue:: Volume 8:Number 3/4(1981)
Issue Display:: Volume 8, Issue 3/4 (1981)
Year:: 1981
Volume:: 8
Issue:: 3/4
Issue Sort Value:: 1981-0008-NaN-0000
Page Start:: 249
Page End:: 249
Publication Date:: 1981
Subjects:: Electronics -- Periodicals
Electronic circuits -- Periodicals
621.3815
Journal URLs:: https://www.hindawi.com/journals/apec/contents/electrocomponent.science.and.technology/ ↗
DOI:: 10.1155/APEC.8.249 ↗
Languages:: English
ISSNs:: 0305-3091
Deposit Type:: Legaldeposit
View Content:: Available online (eLD content is only available in our Reading Rooms) ↗
Physical Locations:: British Library HMNTS - ELD Digital store
Ingest File:: 10695.xml