Cite
HARVARD Citation
Kawabata, K. et al. (1981). Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. Electrocomponent science and technology. p. 249. [Online].
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Kawabata, K. et al. (1981). Electrical Properties of Titanium Nitride Thin Films Deposited by Reactive Sputtering. Electrocomponent science and technology. p. 249. [Online].