Growth and characterization of thin Al-rich AlGaN on bulk GaN as an emitter-base barrier for hot electron transistor. (April 2019)
- Record Type:
- Journal Article
- Title:
- Growth and characterization of thin Al-rich AlGaN on bulk GaN as an emitter-base barrier for hot electron transistor. (April 2019)
- Main Title:
- Growth and characterization of thin Al-rich AlGaN on bulk GaN as an emitter-base barrier for hot electron transistor
- Authors:
- Prystawko, Pawel
Giannazzo, F.
Krysko, M.
Smalc-Koziorowska, J.
Schilirò, E.
Greco, G.
Roccaforte, F.
Leszczynski, M. - Abstract:
- Abstract: In this work, we report on the metal-organic-chemical-vapour-deposition (MOCVD) and characterization of Al-rich thin layers of AlGaN on conductive GaN, to be used as emitter-base barriers for graphene hot electron transistors. After preliminary experiments, aimed to assess the impact of unintentional Ga contaminations on the AlGaN composition, 4.7 nm thick Al0.66 Ga0.33 N films with a 3 nm GaN cap were deposited on the bulk GaN substrate and, for comparison, on a GaN template on sapphire. XRD measurements were employed to evaluate the composition, thickness and fully strained structure state of the ternary AlGaN barrier layers. Atomic force microscopy (AFM) analyses showed a very smooth surface with atomic steps for the AlGaN barrier layer on the bulk crystal, whereas a rougher surface with high density of pits was observed for the films deposited on the GaN/sapphire sample. Finally a graphene heterojunction diode with the Al0.66 Ga0.33 N barrier layer on bulk GaN was fabricated by transfer of CVD grown graphene. Current-voltage characteristics of the diode exhibit very small dependence on the temperature both in forward and reverse polarization, suggesting Fowler-Nordheim (FN) tunneling as the dominant mechanism of current injection from graphene to the AlGaN/GaN two dimensional electron gas (2DEG).
- Is Part Of:
- Materials science in semiconductor processing. Volume 93(2019)
- Journal:
- Materials science in semiconductor processing
- Issue:
- Volume 93(2019)
- Issue Display:
- Volume 93, Issue 2019 (2019)
- Year:
- 2019
- Volume:
- 93
- Issue:
- 2019
- Issue Sort Value:
- 2019-0093-2019-0000
- Page Start:
- 153
- Page End:
- 157
- Publication Date:
- 2019-04
- Subjects:
- Semiconductors -- Periodicals
Integrated circuits -- Materials -- Periodicals
Semiconducteurs -- Périodiques
Circuits intégrés -- Matériaux -- Périodiques
Electronic journals
621.38152 - Journal URLs:
- http://www.sciencedirect.com/science/journal/latest/13698001 ↗
http://www.elsevier.com/journals ↗ - DOI:
- 10.1016/j.mssp.2018.12.036 ↗
- Languages:
- English
- ISSNs:
- 1369-8001
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5396.440600
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 9467.xml