Use of Supramolecular Assemblies as Lithographic Resists. Issue 24 (15th May 2017)

• Record Type: Journal Article
• Authors: Lewis, Scott M.; Fernandez, Antonio; DeRose, Guy A.; Hunt, Matthew S.; Whitehead, George F. S.; Lagzda, Agnese; Alty, Hayden R.; Ferrando‐Soria, Jesus; Varey, Sarah; Kostopoulos, Andreas K.; Schedin, Fredrik; Muryn, Christopher A.; Timco, Grigore A.; Scherer, Axel; Yeates, Stephen G.; Winpenny, Richard E. P.
• Is Part Of: Angewandte Chemie international edition. Volume 56:Issue 24(2017)
• Page Start: 6749
• Page End: 6752
• Publication Date: 2017-05-15
• Subjects: heterometallic compounds -- lithography -- supramolecular assembly -- resist materials; Chemistry -- Periodicals; 540
• DOI: 10.1002/anie.201700224
• Languages: English
• ISSNs: 1433-7851

Abstract

Abstract: A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. Abstract : A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Based on this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.