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HARVARD Citation
Lewis, S. et al. (2017). Use of Supramolecular Assemblies as Lithographic Resists. Angewandte Chemie international edition. 56 (24), pp. 6749-6752. [Online].
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Lewis, S. et al. (2017). Use of Supramolecular Assemblies as Lithographic Resists. Angewandte Chemie international edition. 56 (24), pp. 6749-6752. [Online].