Use of Supramolecular Assemblies as Lithographic Resists. Issue 24 (15th May 2017) - Lewis, Scott M.
Abstract: A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas. Abstract : A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Based on this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.