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MLA Citation
Scott M. Lewis et al.. “Use of Supramolecular Assemblies as Lithographic Resists.” Angewandte Chemie, vol. 129, 2017, pp. 6853–6856. http://access.bl.uk/ark:/81055/vdc_100046615695.0x00005f
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Scott M. Lewis et al.. “Use of Supramolecular Assemblies as Lithographic Resists.” Angewandte Chemie, vol. 129, 2017, pp. 6853–6856. http://access.bl.uk/ark:/81055/vdc_100046615695.0x00005f