Use of Supramolecular Assemblies as Lithographic Resists. (15th May 2017)

• Record Type: Journal Article
• Authors: Lewis, Scott M.; Fernandez, Antonio; DeRose, Guy A.; Hunt, Matthew S.; Whitehead, George F. S.; Lagzda, Agnese; Alty, Hayden R.; Ferrando‐Soria, Jesus; Varey, Sarah; Kostopoulos, Andreas K.; Schedin, Fredrik; Muryn, Christopher A.; Timco, Grigore A.; Scherer, Axel; Yeates, Stephen G.; Winpenny, Richard E. P.
• Is Part Of: Angewandte Chemie. Volume 129:Number 24(2017)
• Page Start: 6853
• Page End: 6856
• Publication Date: 2017-05-15
• Subjects: Heterometallische Verbindungen -- Lithographie -- Resistmaterialien -- Supramolekulare Strukturen; Chemistry -- Periodicals; 540
• DOI: 10.1002/ange.201700224
• Languages: English
• ISSNs: 0044-8249

Abstract

Abstract: A new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.