Cite

MLA Citation

    M. Azzaz et al.. “Improvement of performances HfO2-based RRAM from elementary cell to 16 kb demonstrator by introduction of thin layer of Al2O3.” Solid-state electronics, vol. 125, 2016, pp. 182–188. http://access.bl.uk/ark:/81055/vdc_100070751932.0x00005d
  
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