Hot electrons induced degradation in lattice-matched InAlN/GaN high electron mobility transistors. (January 2016)
- Record Type:
- Journal Article
- Title:
- Hot electrons induced degradation in lattice-matched InAlN/GaN high electron mobility transistors. (January 2016)
- Main Title:
- Hot electrons induced degradation in lattice-matched InAlN/GaN high electron mobility transistors
- Authors:
- Ren, Jian
Yan, Dawei
Mou, Wenjie
Zhai, Yang
Yang, Guofeng
Gu, Xiaofeng - Abstract:
- Abstract: In this paper, lattice-matched Pt/Au-In0.17 Al0.83 N/GaN high electron mobility transistors (HEMTs) were fabricated, and the degradation characteristics of the gate leakage current were investigated by drain-to-source voltage ( V DS ) step-stress measurements under the ON, semi-ON, and OFF stress conditions and at different temperatures, respectively. It is found that, (1) there exists a critical value of V DS, beyond which the gate leakage current begins to increase significantly; and (2) the degradation of gate leakage current has a positive temperature coefficient, indicating that high temperature can accelerate the degradation. A hot electron model is used to explain the experimental results, emphasizing that the hot electrons from the channel can induce additional negatively charged defects at the InAlN/GaN interface, which can increase the local electrical field and introduce a thinner surface barrier and finally enhance the vertical leakage current component, leading to the current degradation. Highlights: We fabricate lattice-matched Pt/Au-In0.17 Al0.83 N/GaN HEMTs. A critical V DS is found beyond which InAlN/GaN HEMTs begin to degrade. V GS and temperature play important roles for the degradation. A hot electron model is used to explain the degradation.
- Is Part Of:
- Microelectronics and reliability. Volume 56(2016)
- Journal:
- Microelectronics and reliability
- Issue:
- Volume 56(2016)
- Issue Display:
- Volume 56, Issue 2016 (2016)
- Year:
- 2016
- Volume:
- 56
- Issue:
- 2016
- Issue Sort Value:
- 2016-0056-2016-0000
- Page Start:
- 34
- Page End:
- 36
- Publication Date:
- 2016-01
- Subjects:
- Lattice-matched InAlN/GaN HEMTs -- Gate leakage degradation -- Step-stress test -- Hot electron model
Electronic apparatus and appliances -- Reliability -- Periodicals
Miniature electronic equipment -- Periodicals
Appareils électroniques -- Fiabilité -- Périodiques
Équipement électronique miniaturisé -- Périodiques
Electronic apparatus and appliances -- Reliability
Miniature electronic equipment
Periodicals
621.3815 - Journal URLs:
- http://www.sciencedirect.com/science/journal/00262714 ↗
http://www.elsevier.com/journals ↗
http://www.elsevier.com/homepage/elecserv.htt ↗ - DOI:
- 10.1016/j.microrel.2015.10.025 ↗
- Languages:
- English
- ISSNs:
- 0026-2714
- Deposit Type:
- Legaldeposit
- View Content:
- Available online (eLD content is only available in our Reading Rooms) ↗
- Physical Locations:
- British Library DSC - 5758.979000
British Library DSC - BLDSS-3PM
British Library HMNTS - ELD Digital store - Ingest File:
- 7896.xml