Cite

MLA Citation

    Mengyuan Hua et al.. “Bias Temperature Instability of Normally‐Off GaN MIS‐FET with Low‐Pressure Chemical Vapor Deposition SiNx Gate Dielectric.” Physica status solidi, vol. 215, no. 10, 2018, p. n/a. http://access.bl.uk/ark:/81055/vdc_100065991573.0x000005
  
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